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sputtering
사용
EnerStream, EnerPulse, EnerPulse Duo, PulseGen, PulseGen Duo series는 스퍼터 Application에 최적화된 부하에 맞도록 설계된 전원장치로 파형에 따라 DC 및 펄스 전원으로 나누어지며, 캐소드의 응용에 따라 Single Magnetron 과 Dual Magnetron 스퍼터로 구분된다. 대용량 DC전원은 EnerStream 모델의 병렬운전으로 DC 160kW 까지 공급이 가능하다.
DC Magnetron Sputter : EnerStream series
-Application : Al, Cu, Ti, Cr, Ni, Si, ITO
-Economic model. Applied to low resistive materials such as metal deposition process
Pulsed DC Magnetron Sputter : EnerPulse & PulseGen series
-Application : Al, Cu, Ti, Cr, Ni, Si, ITO, Graphite, TiN,
-High resistive materials can be used such as silicon deposition process
High quality of thin film is enabled
Dual Magnetron Sputter : EnerPulse & PulsGen Duo series

-Coating Application : Al, Cu, Ti, Cr, Ni, Si, ITO, Graphite, TiN
-High resistive materials can be used such as silicon deposition process
-Two different targets can be sputtered with one plasma power supply
-We enable the precise control of critical variables to vary the composition and other characteristics of thin film

정격사항
Model Power Specifications Type Remarks
EnerStream 1 1 kW 800V / 2.5A DC TBD
EnerStream 3 3 kW 800V / 7,5 A DC TBD
EnerStream 5 5 kW 800V / 12.5 A , < 0.5mJ/1kW DC  
EnerStream 10 10 kW 800V / 25 A , < 0.5mJ/1kW DC  
EnerStream 15 15 kW 800V / 37.5 A , < 0.5mJ/1kW DC  
EnerStream 20 20 kW 800V / 50A , < 0.5mJ/1kW DC  
EnerPulse 5 5 kW 800V / 12.5A (20~150kHz) Pulse  
EnerPulse 10LV 10 kW 800V / 25A (20~30kHz Pulse  
EnerPulse 10 10 kW 650V / 33.3A (20~150kHz) Pulse  
EnerPulse 10MV 10 kW 800V / 25A (20~150kHz) Pulse  
EnerPulse 10HV 10 kW 1000V / 20A (10~50kHz) Pulse  
EnerPulse 10HV 10 kW 800V / 2.5A Pulse  
PulseGen 20 20 kW 800V / 50A (20~100kHz) Pulse  
PulseGen 40 40 kW 800V / 100A (50~80kHz) Pulse  
EnerPulse 10 Duo 10 kW 800V / 25A (20~50kHz) Pulse  
EnerPulse 20 Duo 20 kW 800V / 2.5A Pulse TBD
EnerPulse 40 Duo 40 kW 800V / 100A (20~50kHz) Pulse TBD
* TBD (To be developed)
 
     
   
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